The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Apr. 07, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Yue Chen, Sunnyvale, CA (US);
Jinyu Lu, Santa Clara, CA (US);
Yongmei Chen, San Jose, CA (US);
Jinxin Fu, Fremont, CA (US);
Zihao Yang, Santa Clara, CA (US);
Mingwei Zhu, San Jose, CA (US);
Takashi Kuratomi, San Jose, CA (US);
Rami Hourani, Santa Clara, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Qun Jing, Santa Clara, CA (US);
Jingyi Yang, Santa Clara, CA (US);
David Masayuki Ishikawa, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.