This inventor holds 193 USPTO granted patents, primarily in Ion Beam Sputtering (CPC class H01L21-31116). Top assignees: International Business Machines Corporation, Applied Materials, Inc., Palo Alto Research Center Inc.. Active years: 1997-2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Inventors with similar research interests:
Location History:
- Petaluma, CA (US) (1997 - 1998)
- Ellicott City, MD (US) (2003)
- Richardson, CA (US) (2009)
- Hopewell Junction, NY (US) (2011)
- Yorktown Heights, NY (US) (2000 - 2016)
- Nanjing, CN (2016)
- Philadelphia, PA (US) (2016 - 2017)
- Shanghai, CN (2017)
- Woodbuy, MN (US) (2017 - 2018)
- Redwood City, CA (US) (2018)
- Cupertino, CA (US) (2005 - 2020)
- Sunnyvale, CA (US) (2017 - 2020)
- Shenzhen, CN (2019 - 2021)
- San Mateo, CA (US) (2021)
- Boston, MA (US) (2022)
- Santa Clara, CA (US) (2002 - 2023)
- Woodbury, MN (US) (2020 - 2023)
Company Filing History:
100 out of 166,425 
41 out of 14,502 
13 out of 2,079 
Years Active: 1997-2023
Areas of Expertise:
Title: Ying Zhang: Innovations and Patents
Introduction:
Ying Zhang, based in Yorktown Heights, NY, is a prolific inventor and researcher with an impressive portfolio of patents. His innovative contributions span multiple industries, including materials science and engineering. This article will delve into his latest patents, highlight his career achievements, explore his collaborations, and conclude with an overview of his noteworthy contributions to the field of innovation.
Latest Patents:
Ying Zhang's latest patents showcase his expertise in developing unique compositions and coatings for various applications. One such patent is titled "Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer." This composition presents a styrene-isobutylene block copolymer combined with at least one ethylenically unsaturated monomer. The cured composition demonstrates excellent adhesive properties, making it suitable for applications such as pressure-sensitive adhesives.
Another notable patent is titled "Ion beam sputtering with ion-assisted deposition for coatings on chamber components." This patent introduces a conformal protective layer, a plasma-resistant rare earth oxide film, which acts as a coating on chamber components. The protective layer, with a thickness below 1000 μm, is composed of rare earth oxide films such as Er-Y, Er-Al-Y, Er-Y-Zr, and Er-Al. These coatings offer enhanced durability and protection against plasma-induced damage.
Career Highlights:
Ying Zhang's career has been enriched by his association with esteemed companies, contributing to his breadth of knowledge and expertise in the field. He has made significant contributions during his tenure at International Business Machines Corporation (IBM), a globally recognized technology company. His work at IBM has focused on materials science and engineering, leading to numerous patents that have pushed the boundaries of innovation.
Collaborations:
Throughout his career, Ying Zhang has collaborated with several distinguished researchers and scientists. Among his notable coworkers are Bruce Bennett Doris and Kangguo Cheng. Collaborations such as these are essential for fostering innovative ideas, sharing expertise, and enhancing the overall quality of research and development.
Conclusion:
Ying Zhang's inventiveness and dedication to advancing materials science and engineering have resulted in an impressive portfolio of patents. His contributions reflect his ability to solve complex problems and develop novel solutions for a wide range of applications. Through his collaboration with renowned companies and coworkers, Zhang has been able to leverage the expertise of others to further his own discoveries. Moving forward, it is evident that Zhang's work will continue to shape the world of innovations and patents, leaving a lasting impact on future generations of inventors and researchers.
Disclaimer: The information provided in this article has been compiled from publicly available sources and is intended for informational purposes only.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile