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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11424136 B1

PDFFull Text
Date of Patent:
Aug. 23, 2022

Filed:

Dec. 29, 2020

Rare-earth oxide based coatings based on ion assisted deposition

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jennifer Y. Sun, Mountain View, CA (US);

Biraja P. Kanungo, San Jose, CA (US);

Vahid Firouzdor, San Mateo, CA (US);

Ying Zhang, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Lowenstein Sandler LLP

Primary Examiner:

Jason Berman

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); B65D 43/02 (2006.01); C23C 4/11 (2016.01); C23C 4/12 (2016.01); C23C 4/04 (2006.01); C23C 4/10 (2016.01); C23C 4/01 (2016.01); C23C 14/00 (2006.01); C23C 4/134 (2016.01); C23C 4/14 (2016.01); C23C 4/16 (2016.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67023 (2013.01); B65D 43/02 (2013.01); C23C 4/01 (2016.01); C23C 4/04 (2013.01); C23C 4/10 (2013.01); C23C 4/11 (2016.01); C23C 4/12 (2013.01); C23C 4/134 (2016.01); C23C 4/14 (2013.01); C23C 4/16 (2013.01); C23C 14/0015 (2013.01); C23C 14/0021 (2013.01); C23C 14/0031 (2013.01); C23C 14/0036 (2013.01); C23C 14/0052 (2013.01); C23C 14/0084 (2013.01); C23C 14/0094 (2013.01); C23C 14/08 (2013.01); C23C 14/081 (2013.01); C23C 14/083 (2013.01); C23C 14/088 (2013.01); H01J 37/32477 (2013.01); H01J 37/32495 (2013.01); H01J 37/32513 (2013.01); H01J 37/32559 (2013.01); H01L 21/6708 (2013.01); H01L 21/67063 (2013.01); H01L 21/67069 (2013.01); H01L 21/67086 (2013.01); H01J 2237/334 (2013.01); Y10T 428/131 (2015.01); Y10T 428/139 (2015.01); Y10T 428/1317 (2015.01); Y10T 428/1393 (2015.01);
Abstract

A component for a processing chamber includes a ceramic body having at least one surface with a first average surface roughness. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness that is less than the first average surface roughness.

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