Company Filing History:
Years Active: 2019-2025
Title: Innovations of Yasuyuki Masuda
Introduction
Yasuyuki Masuda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plating technology, holding a total of 18 patents. His work focuses on enhancing the quality and efficiency of plating processes.
Latest Patents
One of his latest patents is a plating apparatus designed to suppress the deterioration of plating quality caused by gas bubbles that remain on the lower surface of a membrane. This innovative plating apparatus includes a plating tank, a substrate holder, and a membrane module. The membrane module consists of a first membrane and a second membrane, which features an inflow port that allows a plating solution to flow from a first region below the second membrane to a second region above it. Additionally, the second membrane is inclined to facilitate the flow of the plating solution. Another notable patent involves a plate used in plating that enhances the accuracy of porosity and flexibility in adjustment. This plate is strategically placed between a substrate and an anode in a plating tank, featuring a pore forming area with various shapes of pores to optimize the plating process.
Career Highlights
Yasuyuki Masuda has worked with notable companies such as Ebara Corporation and Tachi-s Co., Ltd. His experience in these organizations has contributed to his expertise in plating technologies and innovations.
Collaborations
He has collaborated with several professionals in the field, including Masashi Shimoyama and Shao Hua Chang. These collaborations have further enriched his work and led to advancements in plating technology.
Conclusion
Yasuyuki Masuda's contributions to plating technology through his innovative patents and collaborations highlight his significant role in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in enhancing manufacturing processes.