Company Filing History:

18 out of 164,108

International Business Machines Corporation

patents

1 out of 12,867

Advanced Micro Devices Corporation

patents

where one patent can have more than one assignee

Years Active: 2003-2014

where 'Filed Patents' based on already Granted Patents

18 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8754446 - Semiconductor structure having undercut-gate-oxide gate stack enclosed by protective barrier material (2014-06-17),

2. 8513779 - CMOS devices incorporating hybrid orientation technology (HOT) with embedded connectors (2013-08-20),

3. 8288281 - Method for reducing amine based contaminants (2012-10-16),

4. 8242544 - Semiconductor structure having reduced amine-based contaminants (2012-08-14),

5. 8237247 - CMOS devices incorporating hybrid orientation technology (HOT) with embedded connectors (2012-08-07),

6. 8053838 - Structures, fabrication methods, design structures for strained fin field effect transistors (FinFets) (2011-11-08),

7. 7993990 - Multiple crystallographic orientation semiconductor structures (2011-08-09),

8. 7803708 - Method for reducing amine based contaminants (2010-09-28),

9. 7790581 - Semiconductor substrate with multiple crystallographic orientations (2010-09-07),

10. 7790553 - Methods for forming high performance gates and structures thereof (2010-09-07),

11. 7696573 - Multiple crystallographic orientation semiconductor structures (2010-04-13),

12. 7595232 - CMOS devices incorporating hybrid orientation technology (HOT) with embedded connectors (2009-09-29),

13. 7494918 - Semiconductor structures including multiple crystallographic orientations and methods for fabrication thereof (2009-02-24),

14. 7491623 - Method of making a semiconductor structure (2009-02-17),

15. 7393738 - Subground rule STI fill for hot structure (2008-07-01),

Title: Innovations of Inventor Xiaomeng Chen

Introduction

Xiaomeng Chen, an accomplished inventor based in Poughkeepsie, NY, holds an impressive portfolio of 18 patents. His contributions to the fields of semiconductor technology have greatly impacted the industry. This article explores his latest patents, career highlights, and collaborations with other professionals in the field.

Latest Patents

Among Xiaomeng Chen's latest inventions is a semiconductor structure featuring an undercut-gate-oxide gate stack enclosed by protective barrier material. This innovation is directed towards a method of forming a structure with a sealed gate oxide layer, which improves the performance and reliability of semiconductor devices. The structure includes a gate oxide layer formed on a substrate, a gate on the oxide layer, and protective material surrounding the gates to shield the exposed regions of the gate oxide.

Another significant patent is related to CMOS devices that incorporate hybrid orientation technology (HOT) with embedded connectors. This invention pertains to complementary devices, such as n-FETs and p-FETs, which utilize differing surface crystal orientations for improved functionality. The electrically connected n-FET and p-FET feature a conductive connector embedded in the semiconductor substrate, enhancing device integration and performance.

Career Highlights

Xiaomeng Chen's career spans significant contributions to renowned companies, including IBM and Advanced Micro Devices Corporation (AMD). His work has led to advancements in semiconductor technologies, earning him recognition within the industry. His expertise in device structure and materials has positioned him as a key innovator in the field.

Collaborations

Throughout his career, Chen has collaborated with influential colleagues such as Byeong Yeol Kim and William J. Cote. These partnerships have fostered innovation and development within the semiconductor sector, showcasing the importance of teamwork in driving technological advancements.

Conclusion

Xiaomeng Chen's innovative endeavors have significantly advanced semiconductor technology. With a robust portfolio of patents and key collaborations, he continues to influence the field. His commitment to innovation and excellence makes him a notable figure among inventors in the industry.

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