The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Aug. 20, 2007
Xiaomeng Chen, Poughkeepsie, NY (US);
Shwu-jen Jeng, Wappingers Falls, NY (US);
Byeong Y. Kim, Lagrageville, NY (US);
Hasan M. Nayfeh, Poughkeepsie, NY (US);
Xiaomeng Chen, Poughkeepsie, NY (US);
Shwu-Jen Jeng, Wappingers Falls, NY (US);
Byeong Y. Kim, Lagrageville, NY (US);
Hasan M. Nayfeh, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention is directed to a structure and method of forming a structure having a sealed gate oxide layer. The structure includes a gate oxide layer formed on a substrate and a gate formed on the gate oxide layer. The structure further includes a material abutting walls of the gate and formed within an undercut underneath the gate to protect regions of the gate oxide layer exposed by the undercut. Source and drain regions are isolated from the gate by the material.