The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Jul. 16, 2010
Xiaomeng Chen, Poughkeepsie, NY (US);
William Cote, Poughkeepsie, NY (US);
Anthony K. Stamper, Williston, VT (US);
Arthur C. Winslow, Essex Junction, VT (US);
Xiaomeng Chen, Poughkeepsie, NY (US);
William Cote, Poughkeepsie, NY (US);
Anthony K. Stamper, Williston, VT (US);
Arthur C. Winslow, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Method for reducing resist poisoning. The method includes the steps of forming a first structure in a dielectric on a substrate, reducing amine related contaminants from the dielectric and the substrate prior to a formation of a second structure on the substrate such that the amine related contaminates will not diffuse out from either the substrate or the dielectric, wherein the reducing utilizes a plasma treatment which one of chemically ties up the amine related contaminates and binds, traps, or consumes the amine related contaminates during subsequent processing steps, forming the second structure on the substrate, and after the forming of the first structure, preventing poisoning of a resist layer in subsequent processing by the reducing.