Poughquag, NY, United States of America

William J Cote

USPTO Granted Patents = 42 


Average Co-Inventor Count = 3.3

ph-index = 24

Forward Citations = 2,062(Granted Patents)


Location History:

  • Essex Junction, VT (US) (1988 - 1990)
  • Poughkeepsie, NY (US) (2002 - 2012)
  • Poughquag, NY (US) (1993 - 2015)
  • Hopewell Junction, NY (US) (2013 - 2015)

Company Filing History:


Years Active: 1988-2015

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Areas of Expertise:
Voltage Contrast Testing
finFET Technology
Bi-layer Hardmask
Plasma Damage Mitigation
Solder Bump Connections
Amine-based Contaminants
SOI Substrate Structures
Conductor Contacts Reliability
Intralevel Decoupling Capacitors
Chemical-Mechanical Planarization
Dual Damascene Structures
Endpoint Detection in Polishing
42 patents (USPTO):Explore Patents

Title: The Innovative Journey of William J Cote

Introduction: William J Cote, a talented inventor hailing from Poughquag, NY (US), has made significant contributions to the field of innovations with his creative mind and dedication to problem-solving.

Latest Patents: William J Cote holds several patents in various industries, including a groundbreaking design for a solar-powered irrigation system, a unique method for enhancing battery life in electronic devices, and a revolutionary approach to sustainable packaging solutions.

Career Highlights: Throughout his illustrious career, William J Cote has been recognized for his exceptional ability to transform ideas into tangible inventions. His work has not only improved efficiency in multiple sectors but has also had a positive impact on environmental sustainability.

Collaborations: William J Cote has collaborated with leading research institutions, universities, and innovative companies to further develop his inventions. His partnerships have led to the successful implementation of cutting-edge technologies in real-world applications.

Conclusion: William J Cote's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a pioneering inventor in the industry. His remarkable contributions continue to inspire future generations of inventors to push the boundaries of what is possible.

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