The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Dec. 07, 2004
Xiaomeng Chen, Poughkeepsie, NY (US);
William Cote, Poughquag, NY (US);
Anthony K. Stamper, Williston, VT (US);
Arthur C. Winslow, Essex Junction, VT (US);
Xiaomeng Chen, Poughkeepsie, NY (US);
William Cote, Poughquag, NY (US);
Anthony K. Stamper, Williston, VT (US);
Arthur C. Winslow, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for reducing resist poisoning is provided. The method includes forming a first structure in a dielectric on a substrate and reducing amine related contaminants from the dielectric and the substrate created after the formation of the first structure. The method further includes forming a second structure in the dielectric. A first organic film may be formed on the substrate which is then heated and removed from the substrate to reduce the contaminant. Alternatively, a plasma treatment or cap may be provided. A second organic film is formed on the substrate and patterned to define a second structure in the dielectric.