Xiaolan Ba

Title: The Innovative Journey of Inventor Xiaolan Ba

Introduction

Xiaolan Ba, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of tungsten deposition. With a remarkable portfolio comprising 11 patents, she has played an essential role in advancing technologies that enhance manufacturing processes in the semiconductor industry. Her inventive spirit and keen understanding of material science have propelled her to the forefront of innovation.

Latest Patents

Ba's latest patents include groundbreaking methods for nucleation-free tungsten deposition. These innovative approaches allow for the deposition of tungsten (W) films without the need for a nucleation layer. Specifically, her methods involve applying a conformal reducing agent layer, typically containing boron (B) and/or silicon (Si), onto a substrate. This substrate contains features that require filling with tungsten, and the reducing agent layer closely matches the substrate's topography. Once the reducing agent layer is established, it is exposed to a fluorine-containing tungsten precursor, resulting in the formation of elemental tungsten and leading to the development of a conformal tungsten layer.

Additionally, her patents detail methods for filling semiconductor features with tungsten and the related apparatus. These processes involve the deposition of a tungsten nucleation layer prior to the application of a bulk layer, utilizing multiple atomic layer deposition (ALD) cycles. In innovative iterations, both boron and silicon-reducing agents may be employed within a single cycle to effectively interact with a tungsten-containing precursor, facilitating the creation of high-quality tungsten films.

Career Highlights

Throughout her career, Xiaolan Ba has been associated with leading companies in the semiconductor manufacturing sector, including Lam Research Corporation and Applied Materials, Inc. Her work has not only enhanced her expertise in tungsten deposition but has also positioned her as a key contributor to advancements in this vital area of technology.

Collaborations

Xiaolan Ba has collaborated with notable professionals within her field, including Lawrence Schloss and Ruopeng Deng. These collaborations have fostered a dynamic environment for sharing ideas and driving innovation, further emphasising the collective effort within the technology community toward achieving breakthroughs in tungsten deposition techniques.

Conclusion

As an inventor, Xiaolan Ba continues to inspire with her dedication to innovation and her significant contributions to the semiconductor industry. With her extensive patent portfolio and valuable collaborations, she represents the essence of forward-thinking and technological advancement. The methods and inventions she has developed not only reflect her innovative spirit but also promise to have a lasting impact on the field of materials science and manufacturing.