The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Jan. 04, 2017
Lam Research Corporation, Fremont, CA (US);
Hanna Bamnolker, Cupertino, CA (US);
Joshua Collins, Sunnyvale, CA (US);
Tomas Sadilek, San Jose, CA (US);
Hyeong Seop Shin, Suwon, KR;
Xiaolan Ba, San Jose, CA (US);
Raashina Humayun, Los Altos, CA (US);
Michal Danek, Cupertino, CA (US);
Lawrence Schloss, Palo Alto, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Provided herein are methods of depositing fluorine-free tungsten by sequential CVD pulses, such as by alternately pulsing a chlorine-containing tungsten precursor and hydrogen in cycles of temporally separated pulses, without depositing a tungsten nucleation layer. Methods also include depositing tungsten directly on a substrate surface using alternating pulses of a chlorine-containing tungsten precursor and hydrogen without treating the substrate surface.