The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Apr. 15, 2020
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Pragna Nannapaneni, San Jose, CA (US);
Sema Ermez, Santa Clara, CA (US);
Novy Tjokro, Union City, CA (US);
Ruopeng Deng, San Jose, CA (US);
Tianhua Yu, Tracy, CA (US);
Xiaolan Ba, Fremont, CA (US);
Juwen Gao, San Jose, CA (US);
Sanjay Gopinath, Fremont, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/08 (2006.01); H01L 21/285 (2006.01); H01L 21/768 (2006.01); H10B 12/00 (2023.01); H10B 41/27 (2023.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/08 (2013.01); H01L 21/28568 (2013.01); H01L 21/768 (2013.01); H10B 12/00 (2023.02); H10B 41/27 (2023.02); H10B 43/27 (2023.02);
Abstract
Provided herein are methods and related apparatus for purging processing chambers during an atomic layer deposition (ALD) process. The methods involve flowing purging gas from one or more accumulators to remove process gases from the processing chambers. Following the flowing of purging gas, additional reactants may be introduced into the processing chamber to continue an ALD cycle.