Company Filing History:
Years Active: 2024-2025
Title: The Innovative Contributions of Ruopeng DENG in Tungsten Deposition
Introduction
Ruopeng DENG, based in San Jose, CA, is a notable inventor in the field of materials science, particularly known for his work on tungsten deposition technologies. With a total of 5 patents under his name, Ruopeng has significantly contributed to the advancement of methods for efficiently depositing tungsten films, which have vital applications in various industries, including semiconductor manufacturing.
Latest Patents
Ruopeng DENG's recent innovations include two significant patents focused on tungsten deposition processes. The first patent, titled "Nucleation-free tungsten deposition," presents methods for depositing tungsten films without the necessity of a nucleation layer. This innovative approach involves applying a conformal reducing agent layer comprised of boron and/or silicon on a substrate, which is then treated with a fluorine-containing tungsten precursor to form a layer of elemental tungsten. The result is a conformal tungsten layer that efficiently fills substrate features.
The second patent describes enhanced methods for tungsten deposition, highlighting the importance of a tungsten nucleation layer prior to the bulk layer deposition. This method incorporates multiple atomic layer deposition cycles, utilizing both boron-containing and silicon-reducing agents in a single cycle to react with tungsten precursors and efficiently form tungsten films.
Career Highlights
Ruopeng DENG is currently employed at Lam Research Corporation, a leader in providing innovative wafer fabrication equipment and services. His work at Lam Research Corporation places him at the forefront of semiconductor technology innovation. Throughout his career, Ruopeng has consistently focused on exploring and expanding the capabilities of deposition methods to enhance production efficiency and product quality.
Collaborations
Ruopeng DENG collaborates closely with his coworker, Sanjay Gopinath, contributing to a synergy that fosters innovation and the development of advanced technologies in the field of tungsten deposition. Their collaboration combines experience and expertise, further pushing the boundaries of what is achievable in semiconductor manufacturing.
Conclusion
Ruopeng DENG's contributions to tungsten deposition technology exemplify the importance of innovation in material science. With five patents and a strong professional affiliation with Lam Research Corporation, his groundbreaking work sets the stage for future advancements in technology that will continue to benefit the semiconductor industry and beyond.