Pragna Nannapaneni

Title: Pragna Nannapaneni: Innovator in Tungsten Deposition Technologies

Introduction

Pragna Nannapaneni is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor manufacturing. With a focus on tungsten deposition methods, Nannapaneni holds 2 patents that enhance the efficiency and effectiveness of atomic layer deposition (ALD) processes.

Latest Patents

Nannapaneni's latest patents include innovative methods for tungsten deposition. The first patent describes methods of filling features with tungsten, involving the deposition of a tungsten nucleation layer prior to the bulk layer. This process utilizes multiple ALD cycles and incorporates both a boron-containing reducing agent and a silicon-reducing agent to react with a tungsten-containing precursor, ultimately forming a tungsten film. The second patent focuses on rapid flush purging during the ALD process, detailing methods for purging processing chambers by flowing purging gas from accumulators to remove process gases. This technique allows for the introduction of additional reactants to continue the ALD cycle effectively.

Career Highlights

Pragna Nannapaneni is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in advancing deposition technologies that are critical for modern electronics.

Collaborations

Nannapaneni collaborates with talented professionals in his field, including Sema Ermez and Novy Sastrawati Tjokro, who contribute to the innovative environment at Lam Research Corporation.

Conclusion

Pragna Nannapaneni's contributions to tungsten deposition technologies and his work at Lam Research Corporation highlight his role as an influential inventor in the semiconductor industry. His patents reflect a commitment to advancing manufacturing processes that are essential for the future of electronics.