Location History:
- San Jose, CA (US) (2016)
- Tracy, CA (US) (2024)
Company Filing History:
Years Active: 2016-2024
Title: Innovations and Contributions of Inventor Tianhua Yu
Introduction
Tianhua Yu, an accomplished inventor residing in Tracy, California, has made significant contributions to the world of technology with his innovative approaches in the field of atomic layer deposition (ALD). With a portfolio of three patents, Yu demonstrates a commitment to advancing manufacturing techniques that have far-reaching implications in various industries.
Latest Patents
Tianhua Yu's latest patents focus on novel methods and apparatus related to tungsten deposition and rapid flush purging during the ALD process. One of his patents describes methods for filling features with tungsten, which involves the deposition of a tungsten nucleation layer before applying a bulk layer. This innovative approach utilizes multiple ALD cycles and incorporates both boron-containing and silicon-reducing agents to interact with a tungsten-containing precursor, ultimately forming a tungsten film.
Another notable patent from Yu addresses the purging of processing chambers during the ALD process. These methods involve the effective flow of purging gas from accumulators to eliminate process gases, allowing for the introduction of additional reactants to continue the ALD cycle seamlessly. This enhanced efficiency in purging processes highlights Yu's focus on improving manufacturing reliability.
Career Highlights
Tianhua Yu is currently employed at Lam Research Corporation, a renowned leader in the semiconductor manufacturing industry. At Lam Research, Yu has been at the forefront of developing cutting-edge techniques that enhance manufacturing capabilities and improve productivity. His innovative spirit and technical expertise have positioned him as a valuable asset to the company.
Collaborations
In his journey as an inventor, Tianhua Yu collaborates with various talented professionals, including his coworker Ruopeng Deng. This collaboration not only fosters a creative environment but also promotes the sharing of ideas and knowledge, ultimately leading to groundbreaking advancements in their respective fields.
Conclusion
Tianhua Yu's dedication to innovation and his impressive array of patents underscore his influence in the realm of atomic layer deposition technology. As he continues to push the boundaries of manufacturing processes at Lam Research Corporation, his contributions serve as an inspiration for future inventors and innovators in the industry.