Beijing, China

Xia An

USPTO Granted Patents = 14 

Average Co-Inventor Count = 5.6

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2013-2022

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14 patents (USPTO):

Title: Innovations of Inventor Xia An

Introduction

Xia An is a prominent inventor based in Beijing, China. He has made significant contributions to the field of device technology, particularly in radiation-hardened designs. With a total of 14 patents to his name, Xia An continues to push the boundaries of innovation.

Latest Patents

Xia An's latest patents include a method for characterizing fluctuation induced by single particle irradiation in a device. This method involves testing a plurality of devices of varying sizes before and after irradiation to obtain threshold voltage distribution. The results help in correcting process fluctuation models and design margins for devices operating under irradiation. Another notable patent is the radiation-hardened-by-design (RHBD) multi-gate device. This invention features a substrate, source and drain regions, a protruding fin structure, and a field dielectric layer. The design effectively suppresses the sensitivity of the device to single event irradiation, enhancing its reliability.

Career Highlights

Xia An is affiliated with Peking University, where he engages in cutting-edge research and development. His work has garnered attention for its practical applications in enhancing device performance under challenging conditions.

Collaborations

Xia An collaborates with talented individuals such as Ru Huang and Xing Zhang, contributing to a dynamic research environment.

Conclusion

Xia An's innovative work in device technology and his numerous patents highlight his role as a leading inventor in the field. His contributions continue to influence advancements in radiation-hardened designs and device reliability.

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