Oshu, Japan

Wenling Wang

This inventor holds 25 USPTO granted patents, primarily in Heat Treatment Technology. Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted. Active years: 2001-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenling Wang. Retrieved from https://idiyas.com/inventor/wenling-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 96.0

Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 133(Granted Patents)


Location History:

  • Sagamihara, JP (2001)
  • Shiroyama-Machi, JP (2002 - 2005)
  • Tokyo-To, JP (2004 - 2009)
  • Nirasaki, JP (2010 - 2013)
  • Oshu, JP (2011 - 2018)

Company Filing History:


Years Active: 2001-2018

Loading Chart...
Areas of Expertise:
Heat Treatment
Thermal Processing
Temperature Control
Processing Apparatus
Calibration Method
Control System
Batch-Type System
Non-Transitory Medium
Heat Treatment Method
Substrate Processing
Information Processing
Semiconductor Manufacturing
25 patents (USPTO):Explore Patents

Title: **Innovations of Wenling Wang: A Pioneer in Thermal Processing Technology**

Introduction

Wenling Wang is a notable inventor based in Oshu, Japan, who has made significant contributions to the field of thermal processing technology. With a remarkable portfolio of 25 patents, Wang has demonstrated a deep commitment to innovation and excellence in controlling the heat treatment processes. His inventions reflect his expertise and dedication to improving manufacturing techniques.

Latest Patents

Among Wang's notable patents is the **Heat Treatment Apparatus and Method of Controlling the Same**. This invention features a processing chamber that holds a processing object, equipped with a heating unit and a temperature detecting unit. The controller intelligently adjusts the temperatures to ensure optimal heating despite external disturbances. This innovation is crucial for industries requiring precise thermal processing.

Another significant patent is the **Thermal Processing Apparatus and Method of Controlling the Same**. This apparatus introduces a dual control zone model, allowing for either a large-number or small-number control zone configuration based on the temperature control needs. This flexibility enhances efficiency in temperature stabilization and control, showcasing Wang's ability to adapt technology to varying requirements.

Career Highlights

Wenling Wang has held key positions in esteemed companies, including **Tokyo Electron Limited**, where he has applied his innovative ideas in advanced thermal processing technologies. His work has significantly influenced the efficiency and effectiveness of the semiconductor manufacturing processes.

Collaborations

Throughout his career, Wang has collaborated with fellow innovators such as **Tatsuya Yamaguchi** and **Koichi Sakamoto**. Together, they have contributed to advancements in thermal processing technology, sharing a vision of achieving precise and reliable manufacturing standards.

Conclusion

Wenling Wang's inventions pave the way for enhanced thermal processing methods that are crucial to modern manufacturing. His dedication to innovation is evident through his extensive patent portfolio, which continues to impact various industries. As technology evolves, Wang's contributions will undoubtedly play a critical role in shaping future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…