Wang-Pen Mo

Title: Innovator Wang-Pen Mo: A Pioneer in Semiconductor Technology

Introduction

Wang-Pen Mo is a distinguished inventor based in Pingtung, Taiwan, with an impressive portfolio of 15 patents to his name. His contributions to the field of semiconductor technology have significantly impacted the manufacturing processes used in this vital industry.

Latest Patents

Among Wang-Pen Mo's latest innovations are two noteworthy patents. The first patent is a Method of Forming a Photoresist Layer. This method details the process of applying a photoresist layer onto a semiconductor device, which involves multiple spinning cycles at varying speeds while a pre-wet material is dispensed over the wafer. This innovative approach enhances the formation of the photoresist layer, crucial for the performance of semiconductor devices.

The second patent is focused on the Lithography Process on High Topology Features. This method describes the formation of a first photo resist layer over a base structure, followed by a development process that retains important corner features. The introduction of a second photo resist layer allows for precise patterning using a lithography mask, which is essential for creating intricate semiconductor designs.

Career Highlights

Wang-Pen Mo is currently affiliated with Taiwan Semiconductor Manufacturing Company Ltd., a leader in the semiconductor industry. His work at this prestigious company has allowed him to play a key role in advancing innovative manufacturing techniques and processes that deepen the semiconductor industry's capabilities.

Collaborations

Collaboration is integral to Wang-Pen Mo's work, as evidenced by his partnerships with colleagues such as Hung-Chang Hsieh and Chun-Wei Chang. Together, they enhance the quality and innovation of the solutions they develop, driving forward both their individual careers and the progress of their organization.

Conclusion

Through his 15 patents and innovative approaches in semiconductor technology, Wang-Pen Mo exemplifies the spirit of invention and collaboration that is vital to the continuous evolution of the industry. His contributions pave the way for future advancements that will undoubtedly shape the landscape of semiconductor manufacturing for years to come.