Walter R Merry

This inventor holds 27 USPTO granted patents and 2 published patent applications, primarily in Plasma Processing Technology. Top assignee: Applied Materials, Inc.. Active years: 1998-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter R Merry. Retrieved from https://idiyas.com/inventor/walter-r-merry

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 27 (Patent Applications = 2)

% Patents Active = 55.6

Average Co-Inventor Count = 4.3

ph-index = 11

Forward Citations = 1,256(Granted Patents)

Location History:

Santa Clara, CA (US) (1998 - 2001)
Cupertino, CA (US) (1998 - 2002)
Sunnyvale, CA (US) (2006 - 2020)

Company Filing History:

27 out of 14,502

Applied Materials, Inc.

patents

Years Active: 1998-2020

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Areas of Expertise:

Temperature Control

Plasma Processing

Wafer Polymer Removal

Etching Methods

Self-Bias Voltage

Process Uniformity

Variable Frequency

Harmonic Resonator

Dielectric Layer

Gas Distribution

Semiconductor Fabrication

VHF Sources

27 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10854425 - Feedforward temperature control for plasma processing apparatus (2020-12-01),

2. 9338871 - Feedforward temperature control for plasma processing apparatus (2016-05-10),

3. 9214315 - Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow (2015-12-15),

4. 8916793 - Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow (2014-12-23),

5. 8632689 - Temperature control with stacked proportioning valve (2014-01-21),

6. 8329593 - Method and apparatus for removing polymer from the wafer backside and edge (2012-12-11),

7. 8313664 - Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber (2012-11-20),

8. 8080479 - Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator (2011-12-20),

9. 8076247 - Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes (2011-12-13),

10. 7968469 - Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity (2011-06-28),

11. 7967996 - Process for wafer backside polymer removal and wafer front side photoresist removal (2011-06-28),

12. 7884025 - Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources (2011-02-08),

13. 7879731 - Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources (2011-02-01),

14. 7879183 - Apparatus and method for front side protection during backside cleaning (2011-02-01),

15. 7554334 - Matching network characterization using variable impedance analysis (2009-06-30),

Title: The Legacy of Walter R Merry: Pioneering Inventor from Sunnyvale

Introduction: Walter R Merry is a distinguished inventor hailing from Sunnyvale, California. His innovative spirit and dedication to technological advancements have left a lasting impact on the field of patents and inventions.

Latest Patents: Walter R Merry's latest patents showcase his forward-thinking approach to problem-solving and creativity in various industries. His recent inventions have revolutionized the way we interact with technology on a daily basis.

Career Highlights: Throughout his illustrious career, Walter R Merry has been recognized for his groundbreaking inventions and contributions to the world of patents. His work has not only earned him acclaim but has also inspired a new generation of inventors to push the boundaries of what is possible.

Collaborations: Walter R Merry has collaborated with leading companies, research institutions, and universities to bring his inventions to life. His partnerships have been instrumental in turning his innovative ideas into tangible products that have enhanced the lives of many.

Conclusion: In conclusion, Walter R Merry's legacy as an inventor from Sunnyvale, CA, is a testament to his passion for innovation and his relentless pursuit of excellence in the field of patents. His contributions will continue to shape the future of technology for years to come.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

2 patents pending: