The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Apr. 11, 2007
Kenneth S. Collins, San Jose, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kallol Bera, San Jose, CA (US);
Lawrence Wong, Fremont, CA (US);
Walter R. Merry, Sunnyvale, CA (US);
Matthew L. Miller, Fremont, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Andrew Nguyen, San Jose, CA (US);
James P. Cruse, Soquel, CA (US);
James Carducci, Sunnyvale, CA (US);
Troy S. Detrick, Los Altos, CA (US);
Subhash Deshmukh, San Jose, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kallol Bera, San Jose, CA (US);
Lawrence Wong, Fremont, CA (US);
Walter R. Merry, Sunnyvale, CA (US);
Matthew L. Miller, Fremont, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Andrew Nguyen, San Jose, CA (US);
James P. Cruse, Soquel, CA (US);
James Carducci, Sunnyvale, CA (US);
Troy S. Detrick, Los Altos, CA (US);
Subhash Deshmukh, San Jose, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of processing a workpiece in a plasma reactor chamber includes coupling RF power via an electrode to plasma in the chamber, the RF power being of a variable frequency in a frequency range that includes a fundamental frequency f. The method also includes coupling the electrode to a resonator having a resonant VHF frequency F which is a harmonic of the fundamental frequency f, so as to produce VHF power at the harmonic. The method controls the ratio of power near the fundamental f to power at harmonic F, by controlling the proportion of power from the generator that is up-converted from f to F, so as to control plasma ion density distribution.