Matthew L Miller

This inventor holds 35 USPTO granted patents and 2 published patent applications, plus 1 CIPO patent, primarily in Plasma Processing. Top assignees: Applied Materials, Inc., Other. Active years: 2003-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew L Miller. Retrieved from https://idiyas.com/inventor/matthew-l-miller

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35 (Patent Applications = 2)

% Patents Active = 65.7

CIPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 5.6

ph-index = 17

Forward Citations = 1,325(Granted Patents)

Location History:

Fremont, CA (US) (2010 - 2014)
Newark, CA (US) (2003 - 2020)
Rome, NY (US) (2024)

Company Filing History:

33 out of 14,482

Applied Materials, Inc.

patents

1 out of 834,570

Other

patents

where one patent can have more than one assignee

Years Active: 2003-2024

Loading Chart...

Areas of Expertise:

Plasma Processing

Dielectric Film Growth

Capacitively Coupled Plasma

Plasma Load Impedance Tuning

Plasma Reactor

Flow Control

Gas Flow Diffuser

Plasma Uniformity

Inductive Antenna

CVD Chambers

MERIE Plasma Reactor

Magnetic Plasma Control

35 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11865420 - Towel clamp and moisturizer for golf (2024-01-09),

2. 10550472 - Flow control features of CVD chambers (2020-02-04),

3. 10283321 - Semiconductor processing system and methods using capacitively coupled plasma (2019-05-07),

4. 9144147 - Semiconductor processing system and methods using capacitively coupled plasma (2015-09-22),

5. 8894767 - Flow control features of CVD chambers (2014-11-25),

6. 8771538 - Plasma source design (2014-07-08),

7. 8742665 - Plasma source design (2014-06-03),

8. 8629067 - Dielectric film growth with radicals produced using flexible nitrogen/hydrogen ratio (2014-01-14),

9. 8357264 - Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator (2013-01-22),

10. 8337661 - Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator (2012-12-25),

11. 8329262 - Dielectric film formation using inert gas excitation (2012-12-11),

12. 8324525 - Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator (2012-12-04),

13. 8313578 - Etching chamber having flow equalizer and lower liner (2012-11-20),

14. 8237517 - Apparatus for multiple frequency power application (2012-08-07),

15. 8123902 - Gas flow diffuser (2012-02-28),

Title: Matthew L. Miller: Innovator in Semiconductor Technology

Introduction: Matthew L. Miller is a prominent inventor based in Fremont, California, with an impressive portfolio of 34 patents. His innovations primarily focus on semiconductor processing technologies, significantly contributing to advancements in this field.

Latest Patents: Among his latest contributions are two notable patents. The first is related to flow control features of Chemical Vapor Deposition (CVD) chambers, which details an apparatus and methods for gas distribution assemblies. This assembly includes an annular body with a unique design that incorporates a system of apertures for effective gas flow management. The second patent describes substrate processing systems utilizing capacitively coupled plasma (CCP). This patent outlines the design of a CCP unit inside a process chamber, which is crucial for enhancing the efficiency of plasma treatment processes.

Career Highlights: Matthew has made significant strides in his career, working with renowned companies such as Applied Materials, Inc. His involvement in semiconductor technology development has established him as a leading expert in the industry.

Collaborations: Throughout his career, Matthew has collaborated with esteemed colleagues, including Daniel John Hoffman and Steven C. Shannon. These partnerships have played an essential role in fostering innovation and driving technological advancements within the semiconductor sector.

Conclusion: Matthew L. Miller's contributions to the semiconductor industry through his numerous patents exemplify his dedication to innovation. His work continues to shape the future of technology, making lasting impacts on both his field and the broader scientific community.

Profile summary based on public USPTO records.