The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
May. 29, 2008
Steven C. Shannon, Raleigh, NC (US);
Kartik Ramaswamy, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Steven C. Shannon, Raleigh, NC (US);
Kartik Ramaswamy, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method processing a workpiece in a plasma reactor chamber in which a first one of plural applied RF plasma powers is modulated in accordance with a time-varying modulation control signal corresponding to a desired process transient cycle. The method achieves a reduction in reflected power by modulating a second one of the plural plasma powers in response to the time-varying modulation control signal.