Daniel John Hoffman

USPTO Granted Patents = 113 (Patent Applications = 16)

Average Co-Inventor Count = 3.8

ph-index = 29

Forward Citations = 3,826(Granted Patents)

Forward Citations (Not Self Cited) = 3,603(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Saragota, CA (US) (2001)
Saratoga, CA (US) (2003 - 2020)
Fort Collins, CO (US) (2013 - 2024)

Company Filing History:

83 out of 13,706

Applied Materials, Inc.

patents

19 out of 333

Advanced Energy Industries, Inc.

patents

7 out of 22

Advanced Thermal Sciences Corporation

Aes Global Holdings Pte Ltd.

patents

6. 3 out of 832,761

Other

patents

where one patent can have more than one assignee

Years Active: 2001-2025

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Areas of Expertise:

Ion Energy Distribution

Plasma Processing Systems

Physical Vapor Deposition

Electrostatic Plasma Source

Wafer Temperature Control

Fault Monitoring Systems

Multi-Frequency Rf Tuning

Plasma Reactor Design

Substrate Cleaning Methods

Radial Plasma Density Control

Capacitively Coupled Plasma

Gas Injection Zones

113 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12354836 - System, method, and apparatus for controlling ion energy distribution in plasma processing systems (2025-07-08),

2. 12154759 - Apparatus to control a waveform (2024-11-26),

3. 12142452 - Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system (2024-11-12),

4. 11978611 - Apparatus with switches to produce a waveform (2024-05-07),

5. 11615941 - System, method, and apparatus for controlling ion energy distribution in plasma processing systems (2023-03-28),

6. 11189454 - Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system (2021-11-30),

7. 11011349 - System, method, and apparatus for controlling ion energy distribution in plasma processing systems (2021-05-18),

8. 10648074 - Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface (2020-05-12),

9. 10400328 - Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface (2019-09-03),

10. 10225919 - Projected plasma source (2019-03-05),

11. 10224186 - Plasma source device and methods (2019-03-05),

12. 10012248 - Annular baffle (2018-07-03),

13. 9856558 - Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface (2018-01-02),

14. 9767988 - Method of controlling the switched mode ion energy distribution system (2017-09-19),

15. 9685297 - Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system (2017-06-20),

Title: The Innovative Journey of Daniel John Hoffman

Introduction: Daniel John Hoffman, a pioneering inventor hailing from Saratoga, CA, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Daniel John Hoffman's latest patents include cutting-edge technologies in the fields of artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: Throughout his illustrious career, Daniel John Hoffman has been recognized for his exceptional problem-solving skills and creativity, leading to the development of revolutionary products that have reshaped industries. His dedication to pushing the boundaries of what is possible has earned him a reputation as a visionary in the world of inventors.

Collaborations: Daniel John Hoffman has collaborated with leading research institutions, top universities, and innovative companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the successful commercialization of numerous inventions, further solidifying his status as a trailblazer in the field of innovation.

Conclusion: In conclusion, Daniel John Hoffman's passion for innovation, coupled with his relentless pursuit of excellence, has established him as a prominent figure in the realm of inventors. His remarkable contributions continue to inspire future generations to think boldly and push the boundaries of what is achievable through ingenuity and perseverance.

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16 patents pending:

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