The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Aug. 04, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Daniel J. Hoffman, Fort Collins, CO (US);
Kallol Bera, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01J 37/32 (2006.01); F15D 1/00 (2006.01); C23C 16/44 (2006.01); H01L 21/67 (2006.01); C23C 14/22 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
F15D 1/0005 (2013.01); C23C 14/22 (2013.01); C23C 16/44 (2013.01); C23C 16/4412 (2013.01); C23C 16/4585 (2013.01); C23C 16/4586 (2013.01); H01J 37/32009 (2013.01); H01J 37/32623 (2013.01); H01J 37/32633 (2013.01); H01L 21/67069 (2013.01); H01L 21/67109 (2013.01); H01L 21/6831 (2013.01); H01J 2237/334 (2013.01);
Abstract
A baffle assembly for an etching apparatus is disclosed. The baffle assembly comprises a ring and a lower baffle portion having a curved wall extending between a flange portion and a lower frame portion. A heating assembly may be present within the lower frame portion to control the temperature of the baffle. The baffle assembly may help confine the plasma within the processing space in the chamber. The ring may comprise silicon carbide and the lower baffle portion may comprise aluminum.