Fremont, CA, United States of America

John C Valcore, Jr

USPTO Granted Patents = 87 

Average Co-Inventor Count = 2.3

ph-index = 17

Forward Citations = 940(Granted Patents)

Forward Citations (Not Self Cited) = 860(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Mt. View, CA (US) (2014)
  • San Jose, CA (US) (2013 - 2016)
  • Berkeley, CA (US) (2015 - 2021)
  • Fremont, CA (US) (2015 - 2024)

Company Filing History:


Years Active: 2013-2025

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87 patents (USPTO):

Title: The Innovative Journey of John C. Valcore, Jr.

Introduction: John C. Valcore, Jr., based in Fremont, California, is a prolific inventor with an impressive portfolio of 85 patents. His work primarily focuses on enhancing the functionality and efficiency of plasma tools, utilizing advanced technologies to push the boundaries of innovation.

Latest Patents: Valcore's latest patents demonstrate his expertise in sensor technology and RF generators. One of his notable patents, titled "Sensor data compression in a plasma tool," describes systems and methods for compressing data. This involves receiving multiple measurement signals from sensors attached to a radio frequency (RF) transmission path of a plasma tool, converting those signals from analog to digital form, and processing the data to significantly reduce its amount before sending it to a controller.

Another significant patent is "Systems and methods for tuning a MHz RF generator within a cycle of operation of a kHz RF generator." This patent outlines a process where a predetermined periodic waveform is fed into a processor, which utilizes a computer-based model to determine frequency parameters for the waveform. These parameters are subsequently applied to the megahertz RF generator to produce an RF signal during specific operational cycles of the kilohertz RF generator.

Career Highlights: John C. Valcore, Jr. has made remarkable contributions to the field of plasma technology throughout his career at Lam Research Corporation. His innovative solutions have not only advanced the capabilities of plasma tools but have also influenced the broader industry, setting standards in the domain of semiconductor manufacturing.

Collaborations: Valcore has collaborated with notable colleagues, including Bradford J. Lyndaker and Arthur M. Howald. Together, they have transcended conventional boundaries in research and development, fostering an environment of innovation that has spurred new ideas and advancements in technology.

Conclusion: As a leading inventor in the realm of plasma technology, John C. Valcore, Jr. continues to drive progress through his groundbreaking patents and collaborative efforts. His commitment to innovation not only enhances the functionality of existing tools but also paves the way for future developments in the industry.

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