The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Oct. 31, 2019
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Arthur M. Howald, Livermore, CA (US);

John C. Valcore, Jr., Fremont, CA (US);

Andrew Fong, Pleasanton, CA (US);

David Hopkins, Newark, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 15/02 (2006.01); H04B 1/04 (2006.01); G05B 17/02 (2006.01); G06F 30/36 (2020.01);
U.S. Cl.
CPC ...
H04B 1/0475 (2013.01); G05B 17/02 (2013.01); G06F 30/36 (2020.01); H04B 2001/0491 (2013.01);
Abstract

Systems and methods for reducing reflected towards a higher frequency radio frequency (RF) generator during a period of a lower frequency RF generator and for using a relationship to reduce reflected power are described. By tuning the higher frequency RF generator during the period of the lower frequency RF generator, precise control of the higher frequency RF generator is achieved for reducing power reflected towards the higher frequency RF generator. Moreover, by using the relationship to reduce the reflected power, time is saved during processing of a wafer.


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