Pleasanton, CA, United States of America

Arthur M Howald

This inventor holds 52 USPTO granted patents and 4 published patent applications and 2 EPO patents, primarily in RF Power Engineering (CPC class H01L). Top assignee: Lam Research Corporation. Active years: 2000-2025.

USPTO Granted Patents = 52 

% Patents Active = 78.8


Average Co-Inventor Count = 2.5

ph-index = 16

Forward Citations = 1,494(Granted Patents)

Forward Citations (Not Self Cited) = 1,420(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Pleasanton, CA (US) (2000 - 2020)
  • Livermore, CA (US) (2017 - 2024)

Company Filing History:


Years Active: 2000-2025

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Areas of Expertise:
RF Generator
Impedance Matching
Plasma Processing
Power Efficiency
Virtual Metrology
Metal Deposition
Antenna Design
Dielectric Integration
Arcing Minimization
Bias Compensation
Self-Cleaning Etch
Power Delivery
52 patents (USPTO):Explore Patents

Title: The Innovative Journey of Arthur M Howald

Introduction: Arthur M Howald is a renowned inventor based in Pleasanton, California. His contributions to the field of innovation have left a lasting impact on various industries.

Latest Patents: Arthur M Howald holds several patents in the areas of technology and engineering, showcasing his continuous dedication to pushing the boundaries of what is possible.

Career Highlights: Throughout his illustrious career, Arthur M Howald has been recognized for his groundbreaking work in developing cutting-edge solutions that have revolutionized the way we approach challenges in the modern world.

Collaborations: Arthur M Howald has collaborated with leading experts in the field, fostering a culture of innovation and creativity that has led to the development of pioneering technologies.

Conclusion: Arthur M Howald's passion for innovation and his relentless pursuit of excellence continue to inspire inventors and entrepreneurs around the globe. His legacy serves as a testament to the power of creativity and ingenuity in shaping a better future for all.

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