The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Jun. 27, 2017
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Arthur M. Howald, Livermore, CA (US);

John C. Valcore, Jr., Fremont, CA (US);

Andrew Fong, Pleasanton, CA (US);

David Hopkins, Newark, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32926 (2013.01); G06F 17/5063 (2013.01); H01J 37/32183 (2013.01);
Abstract

Systems and methods for tuning an impedance matching network in a step-wise fashion for each state are described. By tuning the impedance matching network in a step-wise fashion for each state instead of directly achieving optimum values of a radio frequency (RF) for each state and directly achieving an optimal value of a combined variable capacitance for each state, processing of a wafer using the tuned optimal values becomes feasible.


Find Patent Forward Citations

Howald, Arthur. (2019). Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an rf generator (U.S. Patent No. 10403482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10403482

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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