The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Apr. 14, 2016
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Arthur M. Howald, Livermore, CA (US);

John C. Valcore, Jr., Fremont, CA (US);

Andrew Fong, Pleasanton, CA (US);

David Hopkins, Newark, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 19/00 (2006.01); H01J 37/32 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); G06F 17/5063 (2013.01); H01J 37/32926 (2013.01);
Abstract

Systems and methods for tuning an impedance matching network in a step-wise fashion for each state transition are described. By tuning the impedance matching network in a step-wise fashion for each state transition instead of directly achieving an optimal value of a combined variable capacitance for each state, processing of a wafer using the tuned optimal values becomes feasible.


Find Patent Forward Citations

Howald, Arthur. (2019). Systems and methods for using computer-generated models to reduce reflected power towards an rf generator during state transitions of the rf generator by controlling rf values of the rf generator (U.S. Patent No. 10276350). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10276350

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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