The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2019

Filed:

Mar. 10, 2016
Applicant:

Advanced Energy Industries, Inc., Fort Collins, CO (US);

Inventors:

Scott Polak, Fort Collins, CO (US);

Daniel Carter, Fort Collins, CO (US);

Karen Peterson, Loveland, CO (US);

Randy Grilly, Pierce, CO (US);

Mike Thornton, Loveland, CO (US);

Daniel J. Hoffman, Fort Collins, CO (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/42 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32532 (2013.01); C23C 16/455 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32357 (2013.01); C23C 14/0063 (2013.01); H05H 1/42 (2013.01);
Abstract

This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.


Find Patent Forward Citations

Loading…