Pierce, CO, United States of America

Randy Grilly

This inventor holds 1 USPTO granted patent. Top assignee: Aes Global Holdings Pte Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Randy Grilly. Retrieved from https://idiyas.com/inventor/randy-grilly

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Randy Grilly

Introduction

Randy Grilly is an accomplished inventor based in Pierce, Colorado. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and methods.

Latest Patents

Randy Grilly holds a patent for a plasma source device and methods. This patent describes a remote plasma source, a gas input manifold, and related methods of making and using. The remote plasma source is equipped with a plasma chamber, a gas input manifold, and an output region. It also includes means for introducing a gas into the plasma chamber, which is configured to impart both a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source. He has 1 patent to his name.

Career Highlights

Randy has worked with Aes Global Holdings Pte Ltd., where he has been able to apply his expertise in plasma technology. His work has contributed to advancements in the field, showcasing his innovative spirit and technical skills.

Collaborations

Randy collaborates with talented individuals such as Scott Polak and Daniel Carter, who share his passion for innovation and technology.

Conclusion

Randy Grilly's contributions to plasma technology through his patent and work at Aes Global Holdings Pte Ltd. highlight his role as a significant inventor in the field. His innovative approaches continue to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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