Loveland, CO, United States of America

Mike Thornton

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Aes Global Holdings Pte Ltd.. Active years: 2019.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Mike Thornton - Innovator in Plasma Technology

Introduction

Mike Thornton is a notable inventor based in Loveland, Colorado. He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and functionality of plasma sources.

Latest Patents

Mike Thornton holds a patent for a "Plasma source device and methods." This patent describes a remote plasma source, a gas input manifold, and related methods of making and using. The invention includes a plasma chamber, a gas input manifold, and an output region. It also features means for introducing gas into the plasma chamber, which are configured to impart both radial and longitudinal velocities on the gas relative to a longitudinal axis through the remote plasma source. This innovation is crucial for various applications in the industry.

Career Highlights

Throughout his career, Mike has demonstrated a strong commitment to advancing plasma technology. His work has not only contributed to the scientific community but has also paved the way for practical applications in various industries. He is currently associated with Aes Global Holdings Pte Ltd., where he continues to innovate and develop new technologies.

Collaborations

Mike Thornton collaborates with talented individuals in his field, including Scott Polak and Daniel Carter. These partnerships enhance the creative process and lead to groundbreaking advancements in plasma technology.

Conclusion

Mike Thornton is a distinguished inventor whose work in plasma technology has made a significant impact. His patent for a plasma source device showcases his innovative spirit and dedication to advancing the field. Through his career and collaborations, he continues to push the boundaries of what is possible in plasma applications.

Profile summary based on public USPTO records.
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