The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
May. 29, 2008
Applicants:
Steven C. Shannon, Raleigh, NC (US);
Kartik Ramaswamy, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Inventors:
Steven C. Shannon, Raleigh, NC (US);
Kartik Ramaswamy, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Matthew L. Miller, Fremont, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma reactor for processing a workpiece such as a semiconductor wafer using predetermined transients of plasma bias power or plasma source power has unmatched low power RF generators synchronized to the transients to minimize transient-induced changes in plasma characteristics.