The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Mar. 21, 2007
Paul Brillhart, Pleasanton, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Matthew L. Miller, Fremont, CA (US);
Paul Brillhart, Pleasanton, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Matthew L. Miller, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a chamber body having an interior volume, a substrate support disposed in the interior volume and a gas distribution assembly having an asymmetrical distribution of gas injection ports. In another embodiment, a method for vacuum processing a substrate is provided that includes disposing a substrate on a substrate support within in a processing chamber, flowing process gas into laterally into a space defined above a gas distribution plate positioned in the processing chamber over the substrate, and processing the substrate in the presence of the processing gas.