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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8357264 B1

PDFFull Text
Date of Patent:
Jan. 22, 2013

Filed:

May. 29, 2008

Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power rf generator

Applicants:

Steven C. Shannon, Raleigh, NC (US);

Kartik Ramaswamy, San Jose, CA (US);

Daniel J. Hoffman, Saratoga, CA (US);

Matthew L. Miller, Fremont, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Inventors:

Steven C. Shannon, Raleigh, NC (US);

Kartik Ramaswamy, San Jose, CA (US);

Daniel J. Hoffman, Saratoga, CA (US);

Matthew L. Miller, Fremont, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Robert M. Wallace

Primary Examiner:

Ram N Kackar

Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a plasma reactor employing source and bias RF power generators, plasma is stabilized against an engineered transient in the output of either the source or bias power generator by a compensating modulation in the other generator.

Find Patent Forward Citations

Shannon, Steven. (2013). Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power rf generator (U.S. Patent No. 8357264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8357264

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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