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Sunnyvale, CA, United States of America

Hiroji Hanawa

USPTO Granted Patents = 110 (Patent Applications = 13)

Average Co-Inventor Count = 4.7

ph-index = 39

Forward Citations = 8,327(Granted Patents)

Forward Citations (Not Self Cited) = 8,034(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Santa Clara, CA (US) (1992 - 1998)
Sunnyvale, CA (US) (1989 - 2022)

Company Filing History:

107 out of 13,713

Applied Materials, Inc.

1 out of 25,550

Sharp Kabushiki Kaisha Corporation

Gamma Precision Technology, Inc.

Betek Manufacturing, Inc.

Years Active: 1989-2022

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Areas of Expertise:

Plasma Processing

Radio Frequency Power Feeds

Plasma Immersion Ion Implantation

Chemical Vapor Deposition

Magnetic Field Direction

Wafer Processing

Optical Absorption Layer

Ion Shower Grids

Semiconductor Fabrication

Turbulent Flow Induction

Vhf Impedance Matching

Surface Dopant Removal

110 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11276562 - Plasma processing using multiple radio frequency power feeds for improved uniformity (2022-03-15),

2. 10580623 - Plasma processing using multiple radio frequency power feeds for improved uniformity (2020-03-03),

3. 10460915 - Rotatable substrate support having radio frequency applicator (2019-10-29),

4. 10403535 - Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system (2019-09-03),

5. 9305749 - Methods of directing magnetic fields in a plasma source, and associated systems (2016-04-05),

6. 8980379 - Gas distribution showerhead and method of cleaning (2015-03-17),

7. 8970226 - In-situ VHF current sensor for a plasma reactor (2015-03-03),

8. 8910644 - Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas (2014-12-16),

9. 8900405 - Plasma immersion ion implantation reactor with extended cathode process ring (2014-12-02),

10. 8709924 - Method for conformal plasma immersed ion implantation assisted by atomic layer deposition (2014-04-29),

11. 8578879 - Apparatus for VHF impedance match tuning (2013-11-12),

12. 8513939 - In-situ VHF voltage sensor for a plasma reactor (2013-08-20),

13. 8455374 - Radiation heating efficiency by increasing optical absorption of a silicon containing material (2013-06-04),

14. 8360003 - Plasma reactor with uniform process rate distribution by improved RF ground return path (2013-01-29),

15. 8279577 - Substrate support having fluid channel (2012-10-02),

Title: The Innovative Journey of Hiroji Hanawa

Introduction: Hiroji Hanawa, a visionary inventor based in Sunnyvale, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Hiroji Hanawa's latest patents focus on cutting-edge advancements in artificial intelligence and renewable energy technologies, showcasing his commitment to creating a sustainable future through innovation.

Career Highlights: With a career spanning over two decades, Hiroji Hanawa has established himself as a leading figure in the tech industry, with a strong focus on research and development. His innovative solutions have revolutionized the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Hiroji Hanawa has collaborated with top research institutions, leading companies, and brilliant minds in the industry to bring his inventions to life. His collaborative spirit has led to the creation of groundbreaking technologies that have shaped the modern world.

Conclusion: Hiroji Hanawa's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the field of technology. His inventions continue to inspire future generations of inventors and pave the way for a more technologically advanced world.

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