The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Aug. 02, 2010
Andrew Nguyen, San Jose, CA (US);
Wing Lau Cheng, Sunnyvale, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Semyon Kats, San Francisco, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Yan YE, Saratoga, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Brian C. Lue, Mountain View, CA (US);
Andrew Nguyen, San Jose, CA (US);
Wing Lau Cheng, Sunnyvale, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Semyon Kats, San Francisco, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Yan Ye, Saratoga, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Brian C. Lue, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.