San Francisco, CA, United States of America

Semyon L Kats

USPTO Granted Patents = 16 

Average Co-Inventor Count = 7.5

ph-index = 13

Forward Citations = 810(Granted Patents)


Company Filing History:


Years Active: 2000-2013

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16 patents (USPTO):

Title: Semyon L Kats: Innovator in Plasma Technology

Introduction

Semyon L Kats is a prominent inventor based in San Francisco, CA, known for his significant contributions to plasma technology. With a total of 16 patents to his name, he has made remarkable advancements in the field of substrate processing.

Latest Patents

Among his latest patents is a cathode with inner and outer electrodes at different heights. This innovative apparatus is designed for generating uniform plasma across and beyond the peripheral edge of a substrate. It features a dielectric body with an upper electrode and an annular electrode embedded within it. The outer perimeter of the upper electrode overlaps the inner perimeter of the annular electrode. In one embodiment, the upper electrode and the annular electrode are electrically coupled by molybdenum vias. The upper electrode is coupled to a DC power source to provide electrostatic force for chucking the substrate. Additionally, it is connected to an RF source for exciting one or more processing gases into plasma for substrate processing.

Another notable patent is a substrate support having a fluid channel. This support for a substrate processing chamber comprises a chuck with a substrate receiving surface. The base includes an upper wall with a recessed trench that has an attachment face at a first depth and a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, effectively closing the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel, while a fluid outlet is available to discharge the heat transfer fluid from the fluid channel.

Career Highlights

Semyon L Kats is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies in the field of plasma processing. His work has significantly impacted the efficiency and effectiveness of substrate processing techniques.

Collaborations

He has collaborated with notable coworkers such as Arnold Kholodenko and Shamouil Shamouilian, contributing to various projects and advancements in their field.

Conclusion

Semyon L Kats is a distinguished inventor whose work in plasma technology has led to numerous patents and innovations. His contributions continue to shape the future of substrate processing, making him a key figure in the industry.

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