The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Jun. 23, 2008
Daniel J. Hoffman, Saratoga, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Dan Katz, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Dan Katz, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus for generating uniform plasma across and beyond the peripheral edge of a substrate has a dielectric body with an upper electrode and an annular electrode embedded therein. The outer perimeter of the upper electrode overlaps the inner perimeter of the annular electrode. In one embodiment, the upper electrode and the annular electrode are electrically coupled by molybdenum vias. In one embodiment, the upper electrode is coupled to a DC power source to provide electrostatic force for chucking the substrate. In one embodiment, the upper electrode is coupled to an RF source for exciting one or more processing gasses into plasma for substrate processing.