The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2001

Filed:

May. 07, 1999
Applicant:
Inventors:

Arnold Kholodenko, San Francisco, CA (US);

Shamouil Shamouilian, San Jose, CA (US);

You Wang, Cupertino, CA (US);

Wing L. Cheng, Sunnyvale, CA (US);

Alexander M. Veytser, Mountain View, CA (US);

Surinder S. Bedi, Fremont, CA (US);

Kadthala R. Narendrnath, San Jose, CA (US);

Semyon L. Kats, San Francisco, CA (US);

Dennis S. Grimard, Ann Arbor, CA (US);

Ananda H. Kumar, Milpitas, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01G 2/300 ;
U.S. Cl.
CPC ...
H01G 2/300 ;
Abstract

An electrostatic chuck,has an electrostatic member,including a dielectric,having a surface,adapted to receive the substrate,The dielectric,covers an electrode,that is chargeable to electrostatically hold the substrate,A support,below the electrostatic member,has a cavity,adapted to hold a gas to serve as a thermal insulator to regulate the flow of heat from the electrostatic chuck,to a surface,of the chamber,The cavity,has a cross-sectional profile that is shaped to provide a predetermined temperature profile across the substrate


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