The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Mar. 08, 2007
Andrew Nguyen, San Jose, CA (US);
Wing Lau Cheng, Sunnyvale, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Kartik Ramaswamy, Santa Clara, CA (US);
Yan YE, Saratoga, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Brian C. Lue, Mountain View, CA (US);
Andrew Nguyen, San Jose, CA (US);
Wing Lau Cheng, Sunnyvale, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Kartik Ramaswamy, Santa Clara, CA (US);
Yan Ye, Saratoga, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Brian C. Lue, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer fluid. In one version, the channel is doubled over to turn back upon itself.