Company Filing History:
10 out of 13,726 
2 out of 832,880 Years Active: 2002-2012
Title: Kwok Manus Wong: Innovator in Substrate Processing Technology
Introduction
Kwok Manus Wong is a prominent inventor based in San Jose, CA (US). He holds a total of 12 patents that showcase his contributions to substrate processing technology. His innovative designs have significantly impacted the field, particularly in the development of systems that enhance the efficiency of substrate processing chambers.
Latest Patents
Among his latest patents, Wong has developed a "Substrate support having fluid channel." This invention features a support for a substrate processing chamber that includes a chuck with a substrate receiving surface. The design incorporates a base with an upper wall that has a recessed trench, which contains an attachment face at a first depth and a fluid channel at a second depth. Additionally, a fluid inlet and outlet are provided to manage the heat transfer fluid effectively.
Another notable patent is the "Substrate support having heat transfer system." This invention consists of a fluid circulating reservoir with a channel that has serpentine convolutions. The fluid inlet supplies heat transfer fluid to the reservoir, while the fluid outlet discharges it. This design enhances the thermal management of substrate processing, ensuring optimal performance.
Career Highlights
Wong has worked with several notable companies, including Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Throughout his career, Wong has collaborated with talented individuals such as Kartik Ramaswamy and Shamouil Shamouilian. These partnerships have fostered innovation and led to the successful development of various technologies.
Conclusion
Kwok Manus Wong's contributions to substrate processing technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in substrate processing systems, making him a key figure in the industry.