The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Apr. 11, 2000
Applicant:
Inventors:
Ashish Bhatnagar, San Jose, CA (US);
Kartik Ramaswamy, Santa Clara, CA (US);
Tony S. Kaushal, Cupertino, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Shamouil Shamouilian, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ;
Abstract
An apparatus and method for reducing hazardous gases exhausted from a process chamber includes an effluent gas treatment system with a gas energizing reactor with an erosion resistant inner surface . Optionally, an additive gas source may be provided to introduce additive gas into the gas energizing reactor . In one embodiment, the inner surface comprises a fluorine-containing compound. In another embodiment, the inner surface comprises an oxide and a stabilizing agent.