The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2002
Filed:
Mar. 07, 2000
Shamouil Shamouilian, San Jose, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Liang-Guo Wang, Milpitas, CA (US);
Alexander M. Veytser, Mountain View, CA (US);
Dennis S. Grimard, Ann Arbor, MI (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process chamber capable of processing a substrate in a plasma comprises a dielectric covering a first electrode and a second electrode , a conductor supporting the dielectric , and a voltage supply to supply an RF voltage to the first electrode or the second electrode in the dielectric . The first electrode capacitively couples with a process electrode to energize process gas in the process chamber and RF voltage applied to the second electrode is capacitively coupled to the conductor and through a collar or the second electrode is directly capacitively coupled through the collar