The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2002
Filed:
Jun. 29, 2000
Shamouil Shamouilian, San Jose, CA (US);
Jon M. McChesney, San Ramon, CA (US);
Kwok Manus Wong, San Jose, CA (US);
Liang-Guo Wang, Milpitas, CA (US);
Alexander M. Veytser, Mountain View, CA (US);
Dennis S. Grimard, Ann Arbor, MI (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
A process chamber capable of processing a substrate in a plasma of process gas. The chamber comprises a support having a dielectric covering an electrode and a conductor below the electrode . A voltage supply supplies a gas energizing voltage to the conductor , and the conductor is adapted to capacitively couple the voltage to the electrode to energize the process gas. Alternatively, the voltage may be supplied to the electrode through a connector which can capacitively couple with the conductor . A DC power supply may also provide an electrostatic chucking voltage to the electrode . In one version, the conductor comprises an interposer