The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
Oct. 23, 2006
Jennifer Y. Sun, Sunnyvale, CA (US);
Elmira Ryabova, Mountain View, CA (US);
Senh Thach, Union City, CA (US);
Xi Zhu, San Jose, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Elmira Ryabova, Mountain View, CA (US);
Senh Thach, Union City, CA (US);
Xi Zhu, San Jose, CA (US);
Semyon L. Kats, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention provide a method for low temperature aerosol deposition of a plasma resistive layer on semiconductor chamber components/parts. In one embodiment, the method for low temperature aerosol deposition includes forming an aerosol of fine particles in an aerosol generator, dispensing the aerosol from the aerosol generator into a processing chamber toward a surface of a substrate, maintaining the substrate temperature at between about 0 degrees Celsius and 50 degrees Celsius, and depositing a layer from material in the aerosol on the substrate surface.