Xi Zhu

Title: Innovations by Inventor Xi Zhu

Introduction

Xi Zhu is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to cleaning processes and material deposition.

Latest Patents

One of Xi Zhu's latest patents is titled "Wet clean process for recovery of anodized chamber parts." This invention presents a cleaning process that is particularly useful for recovering anodized aluminum parts exposed to fluorine-containing plasma in etch reactors. The process involves bathing the part in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. After this treatment, the part is rinsed in water, and the pores of the cleaned anodization can be resealed by submerging the part in hot agitated deionized water.

Another notable patent is "Low temperature aerosol deposition of a plasma resistive layer." This invention provides a method for low-temperature aerosol deposition of a plasma resistive layer on semiconductor chamber components. The method includes forming an aerosol of fine particles in an aerosol generator and dispensing it into a processing chamber toward a substrate surface. The substrate temperature is maintained between about 0 degrees Celsius and 50 degrees Celsius, allowing for the deposition of a layer from the aerosol material onto the substrate surface.

Career Highlights

Xi Zhu is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing innovative solutions that enhance the performance and reliability of semiconductor manufacturing processes.

Collaborations

Xi has collaborated with several talented individuals in his field, including Jennifer Y Sun and Senh Thach. These collaborations have contributed to the advancement of technology in semiconductor applications.

Conclusion

In summary, Xi Zhu is a notable inventor whose work in semiconductor technology has led to valuable patents that improve cleaning processes and material deposition techniques. His contributions continue to influence the industry positively.