The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Mar. 04, 2011
Hua Chung, San Jose, CA (US);
Xizi Dong, Santa Clara, CA (US);
Kyawwin Jason Maung, Daly City, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Sang Won Kang, San Jose, CA (US);
David H. Quach, San Jose, CA (US);
Donald J. K. Olgado, Palo Alto, CA (US);
David Bour, Cupertino, CA (US);
Wei-yung Hsu, San Jose, CA (US);
Alexander Tam, Union City, CA (US);
Anzhong Chang, San Jose, CA (US);
Sumedh Acharya, Pune, IN;
Hua Chung, San Jose, CA (US);
Xizi Dong, Santa Clara, CA (US);
Kyawwin Jason Maung, Daly City, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Sang Won Kang, San Jose, CA (US);
David H. Quach, San Jose, CA (US);
Donald J. K. Olgado, Palo Alto, CA (US);
David Bour, Cupertino, CA (US);
Wei-Yung Hsu, San Jose, CA (US);
Alexander Tam, Union City, CA (US);
Anzhong Chang, San Jose, CA (US);
Sumedh Acharya, Pune, IN;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.