San Jose, CA, United States of America

David H Quach

This inventor holds 29 USPTO granted patents and 13 published patent applications, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Sokudo Co., Ltd.. Active years: 2006-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David H Quach. Retrieved from https://idiyas.com/inventor/david-h-quach

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 75.9

Average Co-Inventor Count = 4.2

ph-index = 10

Forward Citations = 303(Granted Patents)


Company Filing History:


Years Active: 2006-2022

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Areas of Expertise:
Heated Ceramic Faceplate
Substrate Uniformity
Turbulent Flow
HVPE Chamber Hardware
Cluster Tool Architecture
Deposition Chamber
Real-Time Wireless Measurement
Temperature Control
Thermal Units
Group III Nitride Structures
Track Lithography Systems
Electron Beam Treatment
29 patents (USPTO):Explore Patents

Title: Inventor Spotlight: David H Quach

Introduction:

David H Quach, a prolific inventor based in San Jose, CA, has made notable contributions to the field of technology with a total of 29 patents to his name. His innovative spirit and dedication to advancing processes and equipment have earned him recognition in the industry.

Latest Patents:

1. Heated Ceramic Faceplate: David's invention of a heated ceramic faceplate revolutionizes the distribution of gas within a process chamber. The apparatus features a unique design with a heater to elevate temperatures, enhancing efficiency. Additionally, a bridge structure limits heat transfer, optimizing performance.

2. Methods and Apparatus for Controlling Substrate Uniformity: Another groundbreaking innovation by David, this patent introduces a dynamically tunable process kit for processing substrates. The technology allows for flexible adjustments in electrical and thermal states without altering the physical structure. This dynamic feature enhances plasma properties and processing outcomes.

Career Highlights:

David H Quach has an impressive professional background with significant roles in renowned companies such as Applied Materials, Inc., and Sokudo Co., Ltd. His expertise and innovative mindset have propelled him to develop cutting-edge solutions that have a tangible impact on the semiconductor and technology sectors.

Collaborations:

Throughout his career, David has collaborated with esteemed colleagues, including Tetsuya Ishikawa and Rick J Roberts. Together, they have shared insights, expertise, and experiences to drive innovation and create inventive solutions that address industry challenges.

Conclusion:

In conclusion, David H Quach stands out as a visionary inventor with a remarkable portfolio of patents that demonstrate his commitment to driving technological advancements. His dedication to refining processes, improving equipment, and collaborating with industry peers underscores his passion for innovation. David's contributions continue to shape the landscape of technology and inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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