Palo Alto, CA, United States of America

Donald J K Olgado

This inventor holds 29 USPTO granted patents and 2 published patent applications, primarily in Electrochemical Processing. Top assignees: Applied Materials, Inc., Applied Material, Inc.. Active years: 2002-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donald J K Olgado. Retrieved from https://idiyas.com/inventor/donald-j-k-olgado

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 51.7

Average Co-Inventor Count = 3.0

ph-index = 12

Forward Citations = 726(Granted Patents)


Company Filing History:


Years Active: 2002-2015

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Areas of Expertise:
Showerhead Design
Turbulent Flow
Battery Deposition
Chemical Mechanical Polishing
Electroprocessing Control
Flow Diffuser
Ultrasonic Flow Meter
Pad Assembly
Electroless Deposition
Planarization
Wafer Rinse
Modular Cell
29 patents (USPTO):Explore Patents

Title: Inventor Donald J K Olgado - Pioneering Innovations in Palo Alto

Introduction: Donald J K Olgado is a distinguished inventor based in Palo Alto, California, known for his groundbreaking contributions to various technological fields.

Latest Patents: Donald J K Olgado holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a career spanning over two decades, Donald J K Olgado has worked with leading tech companies in Silicon Valley, spearheading projects that have revolutionized the industry.

Collaborations: Throughout his career, Donald J K Olgado has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and excellence in all his projects.

Conclusion: Donald J K Olgado's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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